Remote Center Compliant Flexure Device

ABSTRACT

An apparatus to control displacement of a body spaced-apart from a surface includes a flexure system having a first flexure member defining a first axis of rotation and a second flexure member defining a second axis of rotation. A body is coupled to the flexure system to move about a plurality of axes. An actuation system is coupled to the flexure system to selectively constrain movement of the body along a subset of the plurality of axes.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application is a divisional patent application of U.S. patentapplication Ser. No. 09/698,317, filed Oct. 27, 2000 and entitled“High-Precision Orientation Alignment and Gap Control Stage for ImprintLithography Processes”; U.S. patent application Ser. No. 10/616,799,filed Jul. 10, 2003, entitled “Method of Manufacturing a Vacuum ChuckUsed in Imprint Lithography”; U.S. patent application Ser. No.10/617,321, filed Jul. 10, 2003 and entitled “Method of Separating aTemplate from a Substrate During Imprint Lithography”; U.S. patentapplication Ser. No. 10/775,707, filed Feb. 10, 2004, entitled“Apparatus to Orientate a Body with Respect to a Surface”; U.S. patentapplication Ser. No. 10/785,248, filed Feb. 24, 2004, entitled “Methodto Control the Relative Position Between a Body and a Substrate”; U.S.patent application Ser. No. 10/788,685, filed Feb. 27, 2004, entitled“Method of Orientating a Template with Respect to a Substrate inResponse to a Force Exerted on the Template”; U.S. patent applicationSer. No. 10/806,956, filed Mar. 23, 2004, entitled “Apparatus to ControlDisplacement of a Body Spaced-Apart from a Surface,” all having Byung J.Choi, Sidlgata V. Sreenivasan, and Steven C. Johnson listed asinventors, and all of the aforementioned patent applications beingincorporated herein by reference.

STATEMENT REGARDING FEDERALLY SPONSORED RESEARCH OR DEVELOPMENT

The U.S. Government has a paid-up license in this invention and theright in limited circumstances to require the patent owner to licenseothers on reasonable terms as provided for by the terms ofN66001-98-1-8914 awarded by the Defense Advanced Research ProjectsAgency (DARPA).

TECHNICAL FIELD

The invention relates in general to techniques for small devicemanufacturing and specifically to a system, processes and relateddevices for high precision imprint lithography enabling the manufactureof extremely small features on a substrate, such as a semiconductorwafer. More specifically, the invention relates to methods andcomponents for the orientation and the alignment of a template about asubstrate, as well as their separation without destruction of imprintedfeatures.

BACKGROUND OF THE INVENTION

Without limiting the invention, its background is described inconnection with a process for the manufacture of sub-100 nm devicesusing imprint lithography. In manufacturing, lithography techniques thatare used for large-scale production include photolithography and otherapplication oriented lithography techniques, such as electron beamlithography, ion-beam and x-ray lithography, as examples. Imprintlithography is a type of lithography that differs from these techniques.Recent research has shown that imprint lithography techniques can printfeatures that are smaller than 50 nm. As such, imprint lithography hasthe potential to replace photolithography as the choice forsemiconductor manufacturing in the sub-100 nm regime. It can also enablecost effective manufacturing of various kinds of devices, includingpatterned magnetic media for data storage, micro optical devices, MEMS,biological and chemical devices, X-ray optical devices, etc.

Current research in the area of imprint lithography has revealed a needfor devices that can perform orientation alignment motions between atemplate, which contains the imprint image, and a substrate, whichreceives the image. Of critical importance is the careful and precisecontrol of the gap between the template and the substrate. To besuccessful, the gap may need to be controlled within a few nanometersacross the imprinting area, while, at the same time, relative lateralmotions between the template and the substrate must be eliminated. Thisabsence of relative motion leads is also preferred since it allows for acomplete separation of the gap control problem from the overlayalignment problem.

For the specific purpose of imprinting, it is necessary to maintain twoflat surfaces as close to each other as possible and nearly parallel.This requirement is very stringent as compared to other proximitylithography techniques. Specifically, an average gap of about 100 nmwith a variation of less than 50 nm across the imprinted area isrequired for the imprint process to be successful at sub-100 nm scales.For features that are larger, such as, for example, MEMS or microoptical devices, the requirement is less stringent. Since imprintprocesses inevitably involve forces between the template and the wafer,it is also desirable to maintain the wafer surface as stationary aspossible during imprinting and separation processes. Overlay alignmentis required to accurately align two adjacent layers of a device thatincludes multiple lithographically fabricated layers. Wafer motion inthe x-y plane can cause loss of registration for overlay alignment.

Prior art references related to orientation and motion control includeU.S. Pat. No. 4,098,001, entitled “Remote Center Compliance System;”U.S. Pat. No. 4,202,107, entitled “Remote Axis Admittance System,” bothby Paul C. Watson; and U.S. Pat. No. 4,355,469 entitled “Folded RemoteCenter Compliant Device” by James L. Nevins and Joseph Padavano. Thesepatents relate to fine decoupled orientation stages suitable for aidinginsertion and mating maneuvers in robotic machines and docking andassembly equipment. The similarity between these prior art patents andthe present invention is in the provision for deformable components thatgenerate rotational motion about a remote center. Such rotational motionis generated, for example, via deformations of three cylindricalcomponents that connect an operator and a subject in parallel.

The prior art patents do not, however, disclose designs with thenecessary high stiffness to avoid lateral and twisting motions. In fact,such lateral motion is desirable in automated assembly to overcomemis-alignments during the assembly process. Such motion is highlyundesirable in imprint lithography since it leads to unwanted overlayerrors and could lead to shearing of fabricated structures. Therefore,the kinematic requirements of automated assembly are distinct from therequirements of high precision imprint lithography. The design shown inU.S. Pat. No. 4,355,469 is intended to accommodate larger lateral androtational error than the designs shown in the first two patents, butthis design does not have the capability to constrain undesirablelateral and twisting motions for imprint lithography.

Another prior art method is disclosed in U.S. Pat. No. 5,772,905 (the'905 patent) by Stephen Y. Chou, which describes a lithographic methodand apparatus for creating ultra-fine (sub-25 nm) patterns in a thinfilm coated on a substrate in which a mold having at least oneprotruding feature is pressed into a thin film carried on a substrate.The protruding feature in the mold creates a recess of the thin film.First, the mold is removed from the film. The thin film is thenprocessed such that the thin film in the recess is removed exposing theunderlying substrate. Thus, the patterns in the mold are replaced in thethin film, completing the lithography. The patterns in the thin filmwill be, in subsequent processes, reproduced in the substrate or inanother material which is added onto the substrate.

The process of the '905 patent involves the use of high pressures andhigh temperatures to emboss features on a material using micro molding.The use of high temperatures and pressures, however, is undesirable inimprint lithography since they result in unwanted stresses being placedon the device. For example, high temperatures cause variations in theexpansion of the template and the substrate. Since the template and thesubstrate are often made of different materials, expansion createsserious layer-to-layer alignment problems. To avoid differences inexpansion, the same material can be used but this limits materialchoices and increases overall costs of fabrication. Ideally, imprintlithography could be carried out at room temperatures and low pressures.

Moreover, the '905 patent provides no details relative to the actualapparatus or equipment that would be used to achieve the process. Inorder to implement any imprint lithography process in a productionsetting, a carefully designed system must be utilized. Thus, a machinethat can provide robust operation in a production setting is required.The '905 patent does not teach, suggest or disclose such a system or amachine.

Another issue relates to separation of the template from the substratefollowing imprinting. Typically, due to the nearly uniform contact areaat the template-to-substrate interface, a large separation force isneeded to pull the layers apart. Such force, however, could lead toshearing and/or destruction of the features imprinted on the substrate,resulting in decreased yields.

In short, currently available orientation and overlay alignment methodsare unsuitable for use with imprint lithography. A coupling betweendesirable orientation alignment and undesirable lateral motions can leadto repeated costly overlay alignment errors whenever orientationadjustments are required prior to printing of a field (a field could befor example a 1″ by 1″ region of an 8″ wafer).

Further development of precise stages for robust implementation ofimprint lithography is required for large-scale imprint lithographymanufacturing. As such, a need exists for an improved imprintlithography process. A way of using imprint lithography as a fabricationtechnique without high pressures and high temperatures would providenumerous advantages.

SUMMARY OF THE INVENTION

An apparatus to control displacement of a body spaced-apart from asurface features an actuation system coupled to a flexure system toselectively constrain movement of a body coupled to the flexure systemalong a subset of the plurality of axes. In this manner, unwantedmovement of the body may be constrained to facilitate improvedimprinting techniques. To that end, the apparatus includes a firstflexure member defining a first axis of rotation and a second flexuremember defining a second axis of rotation. The first and the secondflexure members are included in the flexure system. The body is coupledto the flexure system to move about a plurality of axes. The actuationsystem is coupled to the flexure system. In one embodiment, theactuation system provides resistance to translational displacement ofsaid body with respect to a said subset of axes, while allowing freetranslation displacement with respect to axes outside of said subset,and resistance to rotational displacement of said body with respect to asubgroup of the plurality of axes, while allowing free rotationaldisplacement of said body with respect to axes outside of said subgroup.To that end, the actuation system may include one or more piezoactuators. These and other embodiments are discussed more fully below.

BRIEF DESCRIPTION OF THE DRAWINGS

The above objects and advantages, as well as specific embodiments, arebetter understood by reference to the following detailed descriptiontaken in conjunction with the appended drawings in which:

FIGS. 1A and 1B show undesirable gap between a template and a substrate;

FIGS. 2A through 2E illustrate a version of the imprint lithographyprocess according to the invention;

FIG. 3 is a process flow diagram showing the sequence of steps of theimprint lithography process of FIGS. 2A through 2E;

FIG. 4 shows an assembly of an orientation alignment and a gap controlsystem, including both a course calibration stage and a fine orientationalignment and a gap control stage according to one embodiment of theinvention;

FIG. 5 is an exploded view of the system of FIG. 4;

FIGS. 6A and 6B show first and second orientation sub-stages,respectively, in the form of first and second flexure members withflexure joints according to one embodiment of the invention;

FIG. 7 shows the assembled fine orientation stage with first and secondflexure members coupled to each other so that their orientation axesconverge on a single pivot point;

FIG. 8 is an assembly view of the course calibration stage (orpre-calibration stage) coupled to the fine orientation stage accordingto one embodiment;

FIG. 9 is a simplified diagram of a 4-bar linkage illustrating themotion of flexure joints that results in an orientation axis;

FIG. 10 illustrates a side view of the assembled orientation stage withpiezo actuators;

FIGS. 11A and 11B illustrate configurations for a vacuum chuck accordingto the invention;

FIG. 12 illustrates the method for manufacturing a vacuum chuck of thetypes illustrated in FIGS. 11A and 11B;

FIGS. 13A through 13C illustrate use of the fine orientation stage toseparate a template from a substrate using the “peel-and-pull” method ofthe present invention; and

FIGS. 14A through 14C illustrate an alternative method of separating atemplate from a substrate using a piezo actuator.

References in the figures correspond to those in the detaileddescription unless otherwise indicated.

DETAILED DESCRIPTION OF THE EMBODIMENTS

Without limiting the invention, it is herein described in connectionwith a system, devices, and related processes for imprinting very smallfeatures (sub-100 nanometer (nm) range) on a substrate, such as asemiconductor wafer, using methods of imprint lithography. It should beunderstood that the present invention can have application to othertasks, such as, for example, the manufacture of cost-effectiveMicro-Electro-Mechanical Systems (or MEMS), as well as various kinds ofdevices, including patterned magnetic media for data storage, microoptical devices, biological and chemical devices, X-ray optical devices,etc.

With reference now to the figures and specifically to FIGS. 1A and 1B,therein are shown arrangements of a template 12 predisposed with respectto a substrate 20 upon which desired features are to be imprinted usingimprint lithography. Specifically, template 12 includes a surface 14that has been fabricated to take on the shape of desired features which,in turn, are transferred to substrate 20. Between substrate 20 andtemplate 12 lies a transfer layer 18, which receives the desiredfeatures from template 12 via an imprinted layer 16. As is well known inthe art, transfer layer 18 allows one to obtain high aspect ratiostructures (or features) from low aspect ratio imprinted features.

In FIG. 1A, a wedge-shaped imprinted layer 16 results so that template12 is closer to substrate 20 at one end of imprinted layer 16. FIG. 1Bshows imprinted layer 16 being too thick. Both of these conditions arehighly undesirable. The present invention provides a system, processesand related devices for eliminating the conditions illustrated in FIGS.1A and 1B, as well as other orientation problems associated with priorart lithography techniques.

Specifically, for the purpose of imprint lithography, it is necessary tomaintain template 12 and substrate 20 as close to each other as possibleand nearly parallel. This requirement is very stringent as compared toother proximity lithography techniques, such as proximity printing,contact printing, and X-ray lithography, as examples. Thus, for example,for features that are 100 nm wide and 100 nm deep, an average gap ofabout 200 nm or less with a variation of less than 50 nm across theimprinting area of substrate 20 is required for the imprint lithographyprocess to be successful. The present invention provides a way ofcontrolling the spacing between template 12 and substrate 20 forsuccessful imprint lithography given such tight and precise gaprequirements.

FIGS. 2A through 2E illustrate the process, denoted generally as 30, ofimprint lithography according to the invention. In FIG. 2A, template 12is orientated in spaced relation to substrate 20 so that a gap 31 isformed in the space separating template 12 and substrate 20. Surface 14of template 12 is treated with a thin layer 13 to lower the templatesurface energy and to assist in separation of template 12 from substrate20. The manner of orientation including devices for controlling gap 31between template 12 and substrate 20 is discussed below. Next, in FIG.2B, gap 31 is filled with a substance 40 that conforms to the shape ofthe treated surface 14. Essentially, substance 40 forms imprinted layer16 shown in FIGS. 1A and 1B. Preferably, substance 40 is a liquid sothat it fills the space of gap 31 rather easily without the use of hightemperatures and gap 31 can be closed without requiring high pressures.

A curing agent 32, shown in FIG. 2C, is applied to template 12 causingsubstance 40 to harden and to assume the shape of the space defined bygap 31 between template 12 and substrate 20. In this way, desiredfeatures 44, shown in FIG. 2D, from template 12 are transferred to theupper surface of substrate 20. Transfer layer 18 is provided directly onthe upper surface of substrate 20 which facilitates the amplification offeatures transferred from template 12 onto substrate 20 to generate highaspect ratio features.

In FIG. 2D, template 12 is removed from substrate 20, leaving thedesired features 44 thereon. The separation of template 12 fromsubstrate 20 must be done so that desired features 44 remain intactwithout shearing or tearing from the surface of substrate 20. Thepresent invention provides a method and an associated system for peelingand pulling (referred to herein as the “peel-and-pull” method) template12 from substrate 20 following imprinting so the desired features 44remain intact.

Finally, in FIG. 2E, features 44 transferred from template 12, shown inFIG. 2D, to substrate 20 are amplified in vertical size by the action oftransfer layer 18, as is known in the use of bi-layer resist processes.The resulting structure can be further processed to complete themanufacturing process using well-known techniques. FIG. 3 summarizes theimprint lithography process, denoted generally as 50, of the presentinvention in flow chart form. Initially, at step 52, course orientationof a template and a substrate is performed so that a rough alignment ofthe template and the substrate is achieved. The advantage of courseorientation at step 52 is that it allows pre-calibration in amanufacturing environment where numerous devices are to be manufacturedwith efficiency and with high production yields. For example, where thesubstrate comprises one of many die on a semiconductor wafer, coursealignment (step 52) can be performed once on the first die and appliedto all other dies during a single production run. In this way,production cycle times are reduced and yields are increased.

Next, at step 54, the spacing between the template and the substrate iscontrolled so that a relatively uniform gap is created between the twolayers permitting the type of precise orientation required forsuccessful imprinting. The present invention provides a device and asystem for achieving the type of orientation (both course and fine)required at step 54. At step 56, a liquid is dispensed into the gapbetween the template and the substrate. Preferably, the liquid is a UVcurable organosilicon solution or other organic liquids that become asolid when exposed to UV light. The fact that a liquid is usedeliminates the need for high temperatures and high pressures associatedwith prior art lithography techniques.

At step 58, the gap is closed with fine orientation of the templateabout the substrate and the liquid is cured resulting in a hardening ofthe liquid into a form having the features of the template. Next, thetemplate is separated from the substrate, step 60, resulting in featuresfrom the template being imprinted or transferred onto the substrate.Finally, the structure is etched, step 62, using a preliminary etch toremove residual material and a well-known oxygen etching technique isused to etch the transfer layer.

As discussed above, requirements for successful imprint lithographyinclude precise alignment and orientation of the template with respectto the substrate to control the gap in between the template and thesubstrate. The present invention provides a system capable of achievingprecise alignment and gap control in a production style fabricationprocess. Essentially, the system of the present invention provides apre-calibration stage for performing a preliminary and a coursealignment operation between the template and the substrate surface tobring the relative alignment to within the motion range of a finemovement orientation stage. This pre-calibration stage is required onlywhen a new template is installed into the machine (also sometimes knownas a stepper) and consists of a base plate, a flexure component, andthree micrometers or higher resolution actuators that interconnect thebase plate and the flexure component.

With reference to FIG. 4, therein is shown an assembly of the system,denoted generally as 100, for calibrating and orienting a template, suchas template 12, shown in FIG. 1A, about a substrate to be imprinted,such as substrate 20. System 100 can be utilized in a machine, such as astepper, for mass fabrication of devices in a production typeenvironment using the imprint lithography processes of the presentinvention. As shown, system 100 is mounted to a top frame 110 whichprovides support for a housing 120 which contains the pre-calibrationstage for course alignment of a template 150 about a substrate (notshown in FIG. 4).

Housing 120 is seen coupled to a middle frame 114 with guide shafts 112a and 112 b attached to middle frame 114 opposite housing 120. In oneembodiment, three (3) guide shafts are used (the back guide shaft is notvisible in FIG. 4) to provide a support for housing 120 as it slides upand down during vertical translation of template 150. This up-and-downmotion of housing 120 is facilitated by sliders 116 a and 116 b whichattach to corresponding guide shafts 112 a and 112 b about middle frame114.

System 100 includes a disk-shaped base plate 122 attached to the bottomportion of housing 120 which, in turn, is coupled to a disk-shapedflexure ring 124 for supporting the lower placed orientation stagecomprised of first flexure member 126 and second flexure member 128. Theoperation and the configuration of flexure members 126 and 128 arediscussed in detail below. In FIG. 5, second flexure member 128 is seento include a template support 130, which holds template 150 in placeduring the imprinting process. Typically, template 150 comprises a pieceof quartz with desired features imprinted on it, although other templatesubstances may be used according to well-known methods.

As shown in FIG. 5, three (3) actuators 134 a, 134 b and 134 c are fixedwithin housing 120 and are operably coupled to base plate 122 andflexure ring 124. In operation, actuators 134 a, 134 b and 134 c wouldbe controlled such that motion of flexure ring 124 is achieved. Thisallows for coarse pre-calibration. Actuators 134 a, 134 b and 134 c canalso be high resolution actuators which are equally spaced-apart abouthousing 120 permitting the additional functionality of very precisetranslation of flexure ring 124 in the vertical direction to control thegap accurately. In this way, system 100, shown in FIG. 4, is capable ofachieving coarse orientation alignment and precise gap control oftemplate 150 with respect to a substrate to be imprinted.

System 100 of the present invention provides a mechanism that enablesprecise control of template 150 so that precise orientation alignment isachieved and a uniform gap is maintained by the template with respect toa substrate surface. Additionally, system 100 provides a way ofseparating template 150 from the surface of the substrate followingimprinting without shearing of features from the substrate surface. Theprecise alignment, the gap control and the separation features of thepresent invention are facilitated mainly by the configuration of firstand second flexure members 126 and 128, respectively.

With reference to FIGS. 6A and 6B, therein are shown first and secondflexure members 126 and 128, respectively, in more detail. Specifically,first flexure member 126 is seen to include a plurality of flexurejoints 160 coupled to corresponding rigid bodies 164 and 166 which formpart of arms 172 and 174 extending from a flexure frame 170. Flexureframe 170 has an opening 182, which permits the penetration of a curingagent, such as UV light, to reach template 150, shown in FIG. 5, whenheld in template support 130. As shown, four (4) flexure joints 160provide motion of flexure member 126 about a first orientation axis 180.Flexure frame 170 of first flexure member 126 provides a couplingmechanism for joining with second flexure member 128, as illustrated inFIG. 7.

Likewise, second flexure member 128, shown in FIG. 6B, includes a pairof arms 202 and 204 extending from a frame 206 and including flexurejoints 162 and corresponding rigid bodies 208 and 210 which are adaptedto cause motion of flexure member 128 about a second orientation axis200. Template support 130 is integrated with frame 206 of second flexuremember 128 and, like frame 170, shown in FIG. 6A, has an opening 212permitting a curing agent to reach template 150, shown in FIG. 5, whenheld by template support 130.

In operation, first flexure member 126 and second flexure member 128 arejoined, as shown in FIG. 7, to form the orientation stage 250 of thepresent invention. Braces 220 and 222 are provided in order tofacilitate joining of the two pieces such that first orientation axis180, shown in FIG. 6A, and second orientation axis 200, shown in FIG.6B, are orthogonal to each other and intersect at a pivot point 252 atthe template-substrate interface 254. The fact that first orientationaxis 180 and second orientation axis 200 are orthogonal and lie oninterface 254 provide the fine alignment and the gap control advantagesof the invention. Specifically, with this arrangement, a decoupling oforientation alignment from layer-to-layer overlay alignment is achieved.Furthermore, as explained below, the relative position of firstorientation axis 180 and second orientation axis 200 providesorientation stage 250 that can be used to separate template 150 from asubstrate without shearing of desired features so that featurestransferred from template 150 remain intact on the substrate.

Referring to FIGS. 6A, 6B and 7, flexure joints 160 and 162 arenotch-shaped to provide motion of rigid bodies 164, 166, 208 and 210about pivot axes that are located along the thinnest cross section ofthe notches. This configuration provides two (2) flexure-basedsub-systems for a fine decoupled orientation stage 250 having decoupledcompliant orientation axes 180 and 200. The two flexure members 126 and128 are assembled via mating of surfaces such that motion of template150 occurs about pivot point 252 eliminating “swinging” and othermotions that would destroy or shear imprinted features from thesubstrate. Thus, the fact that orientation stage 250 can precisely movetemplate 150 about pivot point 252 eliminates shearing of desiredfeatures from a substrate following imprint lithography.

A system, like system 100, shown in FIG. 4, based on the concept of theflexure components has been developed for the imprinting processdescribed above in connection with FIGS. 2A through 2E. One of manypotential application areas is the gap control and the overlay alignmentrequired in high-resolution semiconductor manufacturing. Anotherapplication may be in the area of single layer imprint lithography fornext generation hard disk manufacturing. Several companies areconsidering such an approach to generate sub-100 nm dots on circularmagnetic media. Accordingly, the invention is potentially useful in costeffective commercial fabrication of semiconductor devices and othervarious kinds of devices, including patterned magnetic media for datastorage, micro optical devices, MEMS, biological and chemical devices,X-ray optical devices, etc.

Referring to FIG. 8, during operation of system 100, shown in FIG. 4, aZ-translation stage (not shown) controls the distance between template150 and the substrate without providing orientation alignment. Apre-calibration stage 260 performs a preliminary alignment operationbetween template 150 and the wafer surfaces to bring the relativealignment to within the motion range limits of orientation stage 250,shown in FIG. 7. Pre-calibration is required only when a new template isinstalled into the machine.

Pre-calibration stage 260 is made of base plate 122, flexure ring 124,and actuators 134 a, 134 b and 134 c (collectively 134) thatinterconnect base plate 122 and flexure ring 124 via load cells 270 thatmeasure the imprinting and the separation forces in the Z-direction.Actuators 134 a, 134 b and 134 c can be three differential micrometerscapable of expanding and contracting to cause motion of base plate 122and flexure ring 124. Alternatively, actuators 134 can be a combinationof micrometer and piezo or tip-type piezo actuators, such as thoseoffered by Physik Instruments, Inc.

Pre-calibration of template 150 with respect to a substrate can beperformed by adjusting actuators 134, while visually inspecting themonochromatic light induced fringe pattern appearing at the interface ofthe template lower surface and the substrate top surface. Usingdifferential micrometers, it has been demonstrated that two flatsurfaces can be oriented parallel within 200 nm error across 1 inchusing fringes obtained from green light.

With reference to FIG. 9, therein is shown a flexure model, denotedgenerally as 300, useful in understanding the principles of operationfor a fine decoupled orientation stage, such as orientation stage 250 ofFIG. 7. Flexure model 300 includes four (4) parallel joints—Joints 1, 2,3 and 4—that provide a four-bar-linkage system in its nominal androtated configurations. The angles α₁ and α₂ between the line 310passing through Joints 1 and 2 and the line 312 passing through Joints 3and 4, respectively, are selected so that the compliant alignment axislies exactly on the template-wafer interface 254 within high precisionmachining tolerances (a few microns). For fine orientation changes, therigid body 314 between Joints 2 and 3 rotates about an axis that isdepicted by Point C. Rigid body 314 is representative of rigid bodies164 and 208 of flexure members 126 and 128, shown in FIGS. 6A and 6B,respectively.

Since a similar second flexure component is mounted orthogonally ontothe first one, as shown in FIG. 7, the resulting orientation stage 250has two decoupled orientation axes that are orthogonal to each other andlie on template-substrate interface 254. The flexure components can bereadily adapted to have openings so that a curing UV light can passthrough template 150 as required in lithographic applications.

Orientation stage 250 is capable of fine alignment and precise motion oftemplate 150 with respect to a substrate and, as such, is one of the keycomponents of the present invention. The orientation adjustment, whichorientation stage 250 provides ideally, leads to negligible lateralmotion at the interface and negligible twisting motion about the normalto the interface surface due to selectively constrained high structuralstiffness. The second key component of the invention is flexure-basedmembers 126 and 128 with flexure joints 160 and 162 which provide for noparticle generation and which can be critical for the success of imprintlithography processes.

This invention assumes the availability of the absolute gap sensingapproach that can measure small gaps of the order of 200 nm or lessbetween template 150 and the substrate with a resolution of a fewnanometers. Such gap sensing is required as feedback if gap control isto be actively measured by use of actuators.

FIG. 10 shows a configuration of orientation stage 250 with piezoactuators, denoted generally as 400. Configuration 400 generates puretilting motions with no lateral motions at template-substrate interface254, shown in FIG. 7. Therefore, a single overlay alignment step willallow the imprinting of a layer on the entire wafer. For overlayalignment, coupled motions between the orientation and the lateralmotions lead to inevitable disturbances in X-Y alignment, which requiresa complicated field-to-field overlay control loop.

Preferably, orientation stage 250 possesses high stiffness in thedirections where side motions or rotations are undesirable and lowerstiffness in directions where necessary orientation motions aredesirable, which leads to a selectively compliant device. Therefore,orientation stage 250 can support relatively high loads while achievingproper orientation kinematics between template 150 and the substrate.

With imprint lithography, a requirement exists that the gap between twoextremely flat surfaces be kept uniform. Typically, template 150 is madefrom optical flat glass using electron beam lithography to ensure thatit is substantially flat on the bottom. The wafer substrate, however,can exhibit a “potato chip” effect resulting in small micron-scalevariations on its topography. The present invention provides a device,in the form of a vacuum chuck 478, as shown in FIG. 12, to eliminatevariations across a surface of the wafer substrate that can occur duringimprinting.

Vacuum chuck 478 serves two primary purposes. First, vacuum chuck 478 isutilized to hold the substrate in place during imprinting and to ensurethat the substrate stays flat during the imprinting process.Additionally, vacuum chuck 478 ensures that no particles are present onthe back of the substrate during processing. This is important toimprint lithography as particles can create problems that ruin thedevice and can decrease production yields. FIGS. 11A and 11B illustratevariations of a vacuum chuck suitable for these purposes according totwo embodiments.

In FIG. 11A, a pin-type vacuum chuck 450 is shown as having a largenumber of pins 452 that eliminates the “potato chip” effect, as well asother deflections, on the substrate during processing. A vacuum channel454 is provided as a means of pulling on the substrate to keep it inplace. The spacing between pins 452 is maintained so the substrate willnot bow substantially from the force applied through vacuum channel 454.At the same time, the tips of pins 452 are small enough to reduce thechance of particles settling on top of them.

Thus, with pin-type vacuum chuck 450, a large number of pins 452 areused to avoid local bowing of the substrate. At the same time, the pinheads should be very small since the likelihood of the particle fallingin between the gaps between pins 452 can be high, avoiding undesirablechanges in the shape of the substrate itself.

FIG. 11B shows a groove-type vacuum chuck 460 with grooves 462 acrossits surface. The multiple grooves 462 perform a similar function to pins452 of pin-type vacuum chuck 450, shown in FIG. 11A. As shown, grooves462 can take on either a wall shape 464 or have a smooth curved crosssection 466. Cross section 466 of grooves 462 for groove-type vacuumchuck 460 can be adjusted through an etching process. Also, the spaceand the size of each groove 462 can be as small as hundreds of microns.Vacuum flow to each of grooves 462 can be provided typically throughfine vacuum channels across multiple grooves that run in parallel withrespect to the chuck surface. The fine vacuum channels can be made alongwith the grooves through an etching process.

FIG. 12 illustrates the manufacturing process for both pin-type vacuumchuck 450, shown in FIG. 11A, and groove-type vacuum chuck 460, shown inFIG. 11B. Using optical flats 470, no additional grinding and polishingsteps are necessary for this process. Drilling at specified places ofoptical flats 470 produces vacuum flow holes 472 which are then maskedand patterned (474) before etching (476) to produce the desiredfeature—either pins or grooves—on the upper surface of optical flat 470.The surface can then be treated (479) using well-known methods.

As discussed above, separation of template 150 from the imprinted layeris a critical and important final step of imprint lithography. Sincetemplate 150 and the substrate are almost perfectly oriented, theassembly of template 150, the imprinted layer, and the substrate leadsto a uniform contact between near optical flats, which usually requiresa large separation force. In the case of a flexible template or asubstrate, the separation can be merely a “peeling process.” However, aflexible template or a substrate is undesirable from the point of viewof high-resolution overlay alignment. In the case of quartz template andsilicon substrate, the peeling process cannot be implemented easily. Theseparation of the template from an imprinted layer can be performedsuccessfully either by one of the two following schemes or thecombination of them, as illustrated by FIGS. 13A, 13B and 13C.

For clarity, reference numerals 12, 18 and 20 will be used in referringto the template, the transfer layer and the substrate, respectively, inaccordance with FIGS. 1A and 1B. After UV curing of substrate 20, eithertemplate 12 or substrate 20 can be tilted intentionally to induce awedge 500 between template 12 and transfer layer 18 on which theimprinted layer resides. Orientation stage 250, shown in FIG. 10, of thepresent invention can be used for this purpose, while substrate 20 isheld in place by vacuum chuck 478, shown in FIG. 12. The relativelateral motion between template 12 and substrate 20 can be insignificantduring the tilting motion if the tilting axis is located close to thetemplate-substrate interface, shown in FIG. 7. Once wedge 500 betweentemplate 12 and substrate 20 is large enough, template 12 can beseparated from substrate 20 completely using Z-motion. This “peel andpull” method results in the desired features 44, shown in FIG. 2E, beingleft intact on transfer layer 18 and substrate 20 without undesirableshearing.

An alternative method of separating template 12 from substrate 20without destroying the desired features 44 is illustrated by FIGS. 14A,148 and 14C. One or more piezo actuators 502 are installed adjacent totemplate 12, and a relative tilt can be induced between template 12 andsubstrate 20, as shown in FIG. 14A. The free end of the piezo actuator502 is in contact with substrate 20 so that when actuator 502 isenlarged, as shown in FIG. 14B, template 12 can be pushed away fromsubstrate 20. Combined with a Z-motion between template 12 and substrate20 (FIG. 14C), such a local deformation can induce a “peeling” and“pulling” effect between template 12 and substrate 20. The free end sideof piezo actuator 502 can be surface treated similar to the treatment ofthe lower surface of template 12 in order to prevent the imprinted layerfrom sticking to the surface of piezo actuator 502.

In summary, the present invention discloses a system, processes andrelated devices for successful imprint lithography without requiring theuse of high temperatures or high pressures. With the present invention,precise control of the gap between a template and a substrate on whichdesired features from the template are to be transferred is achieved.Moreover, separation of the template from the substrate (and theimprinted layer) is possible without destruction or shearing of desiredfeatures. The invention also discloses a way, in the form of suitablevacuum chucks, of holding a substrate in place during imprintlithography.

While this invention has been described with a reference to illustrativeembodiments, the description is not intended to be construed in alimiting sense. Various modifications and combinations of theillustrative embodiments, as well as other embodiments of the invention,will be apparent to persons skilled in the art upon reference to thedescription. It is, therefore, intended that the appended claimsencompass any such modifications or embodiments.

1-17. (canceled)
 18. A system to define a relative orientation between abody and a substrate spaced apart from said body, said systemcomprising: a flexure system having a first flexure member defining afirst axis of rotation and a second flexure member defining a secondaxis of rotation, with said body being coupled to said flexure system torotate about said first and second axes in response to contact with afluid material compressed between said body and said substrate, saidfirst axis extending transversely to said second axis.